| Coral Name |
Interlocked? |
Description |
Location |
| ellipsometer-g |
|
Gaertner ellipsometer |
Bay 1 |
| ellipsometer-r |
|
Rudolf ellipsometer |
Bay 1 |
| four-point-probe |
|
Four point probe |
Bay 1 |
| nanospec-1 |
|
Nanospec #1 |
Bay 1 |
| nanospec-2 |
|
Nanospec 215 |
Bay 1 |
| rta-1 |
yes |
Modular Process RTA |
Bay 1 |
| srd-1 |
|
Spin rinse dryer #1 Semifab |
Bay 1 |
| srd-2 |
|
Spin rinse dryer #2 |
Bay 1 |
| stresstest-1 |
|
ADE stress measurement system |
Bay 1 |
| tube21-ht-oxide |
yes |
High temp oxidation |
Bay 1 |
| tube22-gate-oxide |
yes |
Gate oxidation |
Bay 1 |
| tube23-gen-oxide |
yes |
General diffusion |
Bay 1 |
| tube24-alloy |
yes |
Metal alloy |
Bay 1 |
| tube31-lsn |
yes |
Low stress silicon nitride LPCVD |
Bay 1 |
| tube32-poly |
yes |
Polysilicon LPCVD |
Bay 1 |
| tube33-nitride |
yes |
Silicon nitride LPCVD |
Bay 1 |
| tube34-lto |
yes |
LTO/PSG/BPSG LPCVD |
Bay 1 |
| wb-gen-1 |
|
Wet bench (general) |
Bay 1 |
| wb-hf |
|
Wet bench (HF processing) |
Bay 1 |
| wb-rca |
|
Wet bench (rca) |
Bay 1 |
| asher |
|
Branson O2 asher |
Bay 2 |
| hotplate-hardbake |
|
Hard bake |
Bay 2 |
| hotplate-prebake |
|
Prebake |
Bay 2 |
| hotplate-softbake |
|
Soft bake |
Bay 2 |
| ma6 |
yes |
Karl Suss MA-6 aligner |
Bay 2 |
| maba6 |
yes |
Karl Suss MABA-6 aligner |
Bay 2 |
| mjb-3 |
yes |
Karl Suss MJB-3 aligner |
Bay 2 |
| nanoline-1 |
|
Nanoline #1 |
Bay 2 |
| oven-exhausted |
|
Exhausted Blue M oven |
Bay 2 |
| oven-hardbake |
|
Hard bake oven |
Bay 2 |
| oven-prebake |
|
Prebake dehydration oven |
Bay 2 |
| oven-softbake |
|
Soft bake oven |
Bay 2 |
| sb6 |
yes |
Karl Suss SB-6 bonder |
Bay 2 |
| scope-1 |
|
Olympus BH2 |
Bay 2 |
| scope-2 |
|
Olympus BH2 |
Bay 2 |
| solvent-hood |
|
Fume hood |
Bay 2 |
| spinner-cee1 |
|
CEE resist spinner |
Bay 2 |
| spinner-headway |
|
Headway resist spinner |
Bay 2 |
| srd-3 |
|
Spin rinse dryer #3 |
Bay 2 |
| svgtrack |
|
SVG coat/develop track |
Bay 2 |
| wb-resist |
|
Wet bench resist processing |
Bay 2 |
| wb-sol |
|
Wet bench (solvents) |
Bay 2 |
| aja-sputterer |
yes |
AJA sputter system |
Bay 3 |
| dcsputter |
yes |
PE2400 DC sputterer |
Bay 3 |
| deeptrench |
yes |
Unaxis deep trench etcher |
Bay 3 |
| ebevap-cha |
yes |
CHA E-beam evaporation |
Bay 3 |
| ebevap-temescal |
yes |
Temescal E-beam evaporation |
Bay 3 |
| ionmill |
yes |
Technics ion mill |
Bay 3 |
| pecvd |
yes |
Plasmatherm PECVD |
Bay 3 |
| scope-3 |
|
Nikon Optiphot |
Bay 3 |
| stsetch |
yes |
STS dielectric etcher |
Bay 3 |
| surface-prof-d2a |
|
Dektak IIA |
Bay 3 |
| surface-prof-d3030 |
|
Dektak 3030 |
Bay 3 |
| trion1 |
yes |
Trion RIE (fluorine gases) |
Bay 3 |
| trion2 |
yes |
Trion RIE (chlorine gases) |
Bay 3 |
| wb-etch |
|
Wet bench (etching) |
Bay 3 |
| afm |
yes |
Digital Instruments 3000 AFM |
Bay 4 |
| cpdryer |
yes |
Tousimis critical point dryer |
Bay 4 |
| nanoline-2 |
|
Nanoline #2` |
Bay 4 |
| opg |
|
Optical pattern generator |
Bay 4 |
| oriel |
yes |
Oriel flood exposure system |
Bay 4 |
| raith |
yes |
Raith E-beam lithography |
Bay 4 |
| scope-4 |
|
Olympus SZX12 |
Bay 4 |
| scope-5 |
|
Olympus |
Bay 4 |
| srd-4 |
|
Spin rinse dryer #4 |
Bay 4 |
| wb-koh |
|
Wet bench (KOH) |
Bay 4 |
| wb-maskmaking |
|
Wet bench (maskmaking) |
Bay 4 |
| wirebond-1 |
|
Mech-El wire bonder |
Bay 4 |
| fullam |
|
SEM sputter coater |
Chase 4 |
| lapping-1 |
|
Lapper, Strasbaugh |
Chase 4 |
| saw |
|
Disco wafer saw |
Chase 4 |
| cambridge-sem |
yes |
Cambridge SEM |
Area 2 |
| cmp-oxide |
yes |
Strasbaugh 6EC CMP for oxides |
Area 2 |
| ebevap-varian |
|
Varian E-beam evaporation |
Area 2 |
| thermal-evap |
yes |
Thermal evaporator |
Area 2 |
| wb-gen-2 |
|
Wet bench (general, Area 2) |
Area 2 |
| cviv |
|
CV-IV measurement system |
Area 3 |