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NFC Short Course Schedules

Photolithography and Contact aligner short course is scheduled.
There will be a combined photolithography and contact aligner shortcourse on:
Wed June 6 from 8:45-11:00 in Bay 2. Meet in Bay 2 at 8:45am.

The short course you will learn how to:

      * spin photoresist
      * Bake
      * Align
      * Expose
      * Development of resist
      * Photo resist basics

You will be expected to have reviewed the SOP's before class.
This is a hands on class where students will align some pratice wafers.
Please review the information at the following link Before attending the class.
http://www.nfc.umn.edu/photolithography/index.html
1) The intro to Photolithography presentation.
2) The Required SOP's (on the left side) for all the required equipment.
Bring a copy of the SOP's with you to class.

Also review the link below. the is a lot of information that has been recently posted
about the types of resists we have and some examples on how to process wafers. http://www.nfc.umn.edu/sop/Bay-2/photo-info.html
| | Reply by email if you plan on attending along with your budget/account number.
Contact mille274@umn.edu    or csmiller@umn.edu  if you have any questions or plan to attend.


ALD system short course is scheduled.

Are you looking to use the ALD system we have in Bay 1?
The films available are Al2O3 and HfO2.
If you have a need to use the system there will be a short course at:
10:00 AM Wednesday, June 6th 2007 in Bay 1. Meet in Bay 1 about 5 min before.
Contact whipp003@umn.edu if you have any questions.